Electron Beam Litography

Brand / Model

Raith Pioneer


Filament type: Tungsten, LaB6
Sample travel range: 50x50x25 mm
Beam size (resolution): ≤ 2.5 nm (≤ 1.6 nm)
Minimum feature size: ≤ 20 nm
Field stitching: ≤ 50 (60)nm (m+2σ)
Overlay accuracy (alignment): ≤ 50 (60)nm (m+2σ)
Beam current drift: ≤ 0.5% / 1 hour
Writing speed: 2.5 MHz


Electron Beam Lithography (EBL) allows users to write patterns with high resolution, <10 nm in size. Focused electron beams scan according to a pattern defined on a CAD file over a sample coated with an electron-sensitive resist. The sample is then developed in an appropriate solvent which reveals the structures defined into the resist. In this way, nano-sized architectures are developed.


Terms of sample delivery: 




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Click here for letter of application for industrial service.

Authorized: Cesim Narmanoğlu – Sample Acceptance Unit | Phone:+90 232 301 90 10 | E-mail: cesim.narmanoglu@deu.edu.tr

EMUM Secretary | Phone: 0232 301 90 01 | E-mail: emum@deu.edu.tr