PLD – Pulsed Lazer Deposition


Brand / Model

Neocera EX350


Substrate Size: 10mm x 10mm to Ø 50.8 mm
Deposition Chamber Size: Ø 457.2 mm
Base Vacuum: 5 x 10-7 Torr standard
5 x 10-9 Torr with UHV Upgrades
Substrate Temperature: 850 °C (max.)
Multi-Target Carousel: 6 x 1 inch or 3 x 2 inch
Mass Flow Controller(s): One MFC for Oxygen is standard, more optional


Pulsed Laser Deposition (PLD) system is a robust and versatile thin film deposition system that incorporates a 248nm Krypton Fluorine laser with a high vacuum chamber capable of holding multiple targets and substrates. The Laser is manufactured by GAM laser. The basic operating principles of the PLD system are thus: 248nm wavelength light from the KrF laser enters the chamber and strikes the target. Material is ablated from the target and this material travels towards the substrate. The laser light is pulsed at a rate between 1 and 20 Hz with fluence values as high as 1.1J/cm². During ablation the target rasters back and forth under the laser light to ensure that the target will be ablated evenly. The PLD device is used to precisely deposit thin films with the same composition of the target materials which could be YBCO superconductors etc. on the substrate.



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