Features

Substrate area: 25 mm x 50 mm
Furnace: 3-zone resistance furnace
for temp. up to 1200 °C
Control: CVDWinPrC™ software
Gas Lines: MFC controlled

Aim

Chemical vapor deposition (CVD) is a deposition method used to produce high quality, high performance, solid materials, typically under vacuum. The process is often used in the semiconductor industry to produce thin films.