emum-torr-dc-2

Brand / Model 

Torr International CRC-600

Features 

Accumulation Bowl : 20 x 24 inches
Vacuum Level: 10-7 Torr
Sample Size: Ø 4 inch (max.)
Flow Controller: One for Ar
Cathode: One piece, Ø 2 inch
Power Supply: DC
Thickness Measurement Unit: 0.1Å/s with 1-4 QCM

Aim

DC power source magnetron sputtering system is used to produce metal type thin films on various substrates such as ITO coated PET, ITO coated CAM, glass, quartz, silicon, etc.

emum-pvd

Brand / Model 

Nanovak NVTH-350

Features

Accumulation Bowl : 33 x 33 x 37.5 cm
Vacuum Level: 10-7 Torr
Sample Size: Ø 4 inches (max.)
Sample Heating: Room. temp. – 300 °C
Sample Rotation Yes
Flow Controller: One for Ar
Cathode: One piece, Ø 2 inch
Power Supply: RF power supply,
13.56 MHz, 300W
Thickness Measurement Unit: 0.1Å/s with 1-4 QCM

Aim

RF power induced magnetron sputtering system is used to produce different kinds of thin films, such as metals, semiconductors, dielectrics, transparent oxide conductors etc., ITO coated PET or glass, silicon etc., on various substrates.