Features

Spin speed: 1 – 12,000 rpm
Spin speed accuracy: ± 0.1 rpm
Spin rotational direction: Clockwise (CW),
counter CW, puddle
Max. acceleration: 30,000 rpm/sec
Max. substrate size: Ø 160 mm
Max. process chamber: Ø 202 mm

Aim

It is frequently used in thin film formation studies by precise surface coating of liquids.